Reaction of dimethylethylamine alane and ammonia on Si(100) during the atomic layer growth of AlN: Static SIMS, TPSIMS, and TPD

Surface Science

Volumn 453, Issue 1-3, 2000, Pages 119-129

  Kuo, J S ^a   Rogers Jr , J W ^a,b  

^a University of Washington   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

Chemical vapor deposition; Growth; Nitrides; Polycrystalline surfaces; Secondary ion mass spectroscopy; Semiconductor insulator interfaces; Surface chemical reaction; Thermal desorption spectroscopy

Indexed keywords

EID: 0000103059     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00328-9     Document Type: Article

References (40)

1. Y. Matsumiya, K. Kitahara, N. Ohtsuka, K. Nakajima, Jpn. J. Appl. Phys. 34 (1995) L17.
2. B.-Y. Kim, X. Li, S.-W. Rhee, Appl. Phys. Lett. 68 (1996) 3567.
3. I. Karpov, G. Bratina, L. Sorba, A. Franciosi, M.G. Simmonds, W.L. Gladfelter, J. Appl. Phys. 76 (1994) 3471.
4. K. Hayama, T. Togun, M. Ishida, J. Cryst. Growth 179 (1997) 438.
5. M.G. Simmonds, W.L. Gladfelter, H. Li, P.H. McMurry, J. Vac. Sci. Technol. A 11 (1993) 3026.
6. M. Nagano, S. Iwai, K. Nemoto, Y. Aoyagi, Jpn. J. Appl. Phys. 33 (1994) L1289.
7. K.M. Chen, T. Castro, A. Franciosi, W.L. Gladfelter, Appl. Phys. Lett. 60 (1992) 2132.
8. J.H. Wilkie, G.J.M. van Eyden, D.M. Frigo, C.J. Smit, P.J. Reuvers, S.M. Olsthoorn, F.A.J.M. Driessen, in: T. Ikegami, F. Hasegawa, Y. Takeda (Eds.), Gallium Arsenide and Related Compounds, MRS, No. 1992, p. 115.
9. K. Hayama, T. Togun, M. Ishida, J. Cryst. Growth 179 (1997) 433.
10. J.N. Kidder Jr., J.S. Kuo, A. Ludviksson, T.P. Pearsall, J.W. Rogers Jr., J.M. Grant, L.R. Allen, S.T. Hsu, J. Vac. Sci. Technol. A 13 (1995) 711.
11. J.N. Kidder Jr., J.S. Kuo, T.P. Pearsall, J.W. Rogers Jr., in: F.A. Ponce, R.D. Dupuis, S. Nakamura, J.A. Edmond (Eds.), Gallium Nitride and Related Materials, MRS, No. 1996, p. 249.
12. A. Ludviksson, D.W. Robinson, J.W. Rogers Jr., Thin Solid Films 289 (1996) 6.
13. C.M.B. Marsch, T.P. Hamilton, Y. Xie, H.F. Schaefer, J. Chem. Phys. 96 (1992) 5310.
14. L.H. Dubois, B.R. Zegarski, C.-T. Kao, R.G. Nuzzo, Surf. Sci. 236 (1990) 77.
15. H. Liu, J.W. Rogers Jr., J. Vac. Sci. Technol. 17 (1999) 325.
16. E. Wiberg, E. Amberger, in: Hydrides of the Elements of Main Groups I-IV, Elsevier, Amsterdam, 1971, p. 383.
17. R. Ehrlich, A.R. Young, B.M. Liechstein, D.D. Perry, Inorg. Chem. 3 (1964) 628.
18. J.S. Kuo, Surface investigations of the atomic layer growth mechanism in aluminum nitride thin film deposition using dimethylethylamine alane and ammonia. Ph.D. Thesis, University of Washington, 1999.
19. J.S. Kuo, J.W. Rogers Jr., unpublished results.
20. X.-L. Zhou, C.R. Flores, J.M. White, Surf. Sci. 268 (1992) L267.
21. E.A. Slaughter, J.L. Gland, J. Vac. Sci. Technol. A 10 (1992) 66.
22. M.J. Dresser, P.A. Taylor, R.M. Wallace, W.J. Choyke, J.T. Yates, Surf. Sci. 218 (1989) 75.
23. A. Ishizaka, Y. Shiraki, J. Electrochem. Soc. 133 (1986) 666.
24. K. Mann, M.L. Yu, Phy. Rev. B 35 (1987) 6043.
25. L. Kubler, J.L. Bischoff, D. Bolmont, Phy. Rev. B 38 (1988) 13113.
26. D. Briggs, A. Brown, J.C. Vickerman, in: Handbook of Static Secondary Ion Mass Spectrometry, Wiley, New York, 1989, p. 12.
27. J.C. Vickerman, A. Brown, N.M. Reed, in: Secondary Ion Mass Spectrometry: Principles and Applications, Oxford University Press, New York, 1989, p. 69.
28. J. Zabicky, Detection, determination and characterization of amines, in: S. Patai (Ed.), The Chemistry of the Amino Group, Wiley, New York, 1968.
29. F.W. McLafferty, F. Turecek, in: Interpretation of Mass Spectra, University Science Books, Sausalito, 1993, p. 270.
30. R.G. Cooks, K.L. Busch, Int. J. Mass Spectrum. Ion. Phys. 53 (1983) 111.
31. M. Takahashi, I. Watanabe, S. Ikeda, J. Electron Spectrosc. Relat. Phenom. 37 (1985) 275.
32. F.W. McLafferty, F. Turecek, Interpretation of Mass Spectra, University Science Books, Sausalito, 1993.
33. R.M. Silverstein, G.C. Bassler, T.C. Morrill, Spectrometric Identification of Organic Compounds, Wiley, New York, 1981.
34. S. Nagai, Nucl. Instrum. Methods 59 (60) (1991) 936.
35. F.M. Elms, R.N. Lamb, P.J. Pigram, M.G. Gardiner, B.J. Wood, C.L. Raston, Chem. Mater. 6 (1994) 1059.
36. D.-A. Klug, C.M. Greenlief, J. Vac. Sci. Technol. A 14 (1996) 1826.
37. H. Liu, Metalorganic chemical vapor deposition of aluminum nitride: mechanistics and surface chemistry studies. Ph.D. Thesis, University of Washington, 1995.
38. W.R. Creasy, S.W. McElvany, Surf. Sci. 201 (1988) 59.
39. E. Wiberg, E. Amberger, in: Hydrides of the Elements of Main Groups I-IV, Elsevier, Amsterdam, 1971, p. 381.
40. J.S. Kuo, J.W. Rogers Jr., in: F.A. Ponce, S.P. DenBaars, B.K. Meyer, S. Nakamura, S. Strite (Eds.), Nitride Semiconductors, MRS, No. 482, MRS, 1997, p. 33.