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Volumn 213, Issue 3-4, 2000, Pages 299-307

Composition and morphology of SiGe alloys grown on Si(100) using an Sb surfactant

Author keywords

Si molecular beam epitaxy; SiGe; Surfactant assisted growth; TEM; XPS; XRD

Indexed keywords


EID: 0000063423     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00369-9     Document Type: Article
Times cited : (12)

References (43)
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    • T. Ide, Phys. Rev. B 51 (8) (1995) 5397.
    • (1995) Phys. Rev. B , vol.51 , Issue.8 , pp. 5397
    • Ide, T.1
  • 24
    • 0347274958 scopus 로고    scopus 로고
    • personal communication
    • M. Fatemi, personal communication.
    • Fatemi, M.1
  • 35
    • 0000617047 scopus 로고
    • I. Markov, Phys. Rev. B 50 (15) (1994) 11271.
    • (1994) Phys. Rev. B , vol.50 , Issue.15 , pp. 11271
    • Markov, I.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.