Sn-containing composite thin films by plasma deposition of tetramethyltin

Thin Solid Films

Volumn 472, Issue 1-2, 2005, Pages 58-63

  Hu, Jianjiang ^a,b   Zong, Yun ^a,b   Wang, Yu Zhong ^c   Förch, Renate ^b   Knoll, Wolfgang ^a,b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^c SICHUAN UNIVERSITY   (China)

Author keywords

Deposition ablation balance; Plasma on off time; Surface morphology; Tetramethyltin

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; PLASMAS; REFLECTION; TIN;

DEPOSITION/ABLATION BALANCE; PLASMA ON-/OFF-TIME; PULSED PLASMA PROCESSES; TETRAMETHYLTIN;

THIN FILMS;

EID: 9944231952     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.100     Document Type: Article

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