Preparation of SnO2 thin film by plasma-assisted metalorganic chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 6 A, 1996, Pages

  Shirakata, Sh ^a   Yokoyama, A ^a   Isomura, Sh ^a  

^a EHIME UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; ELECTRIC PROPERTIES; GASES; HALL EFFECT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; PLASMA APPLICATIONS; THIN FILMS;

OXIDE FILMS; TETRABUTYLTIN; TRANSPARENT CONDUCTING FILM;

FILM PREPARATION;

EID: 0030168804     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l722     Document Type: Article

References (12)