Crystallization process of amorphous silicon-carbon alloys

Thin Solid Films

Volumn 411, Issue 2, 2002, Pages 298-302

  Calcagno, L ^a   Musumeci, P ^a   Roccaforte, F ^a   Bongiorno, C ^a   Foti, G ^a  

^a Dipartimento di Fisica   (Italy)

Author keywords

Alloys; Annealing; Grains; Structure

Indexed keywords

CARBON; CHEMICAL SENSORS; CRYSTALLIZATION; INFRARED SPECTROSCOPY; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMAL CONDUCTIVITY; TRANSMISSION ELECTRON MICROSCOPY;

CARBON ALLOYS; FREQUENCY DEVICES FABRICATION; VACUUM FURNACE;

AMORPHOUS SILICON;

EID: 9744248900     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00332-2     Document Type: Article

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