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Volumn 79, Issue 10, 1999, Pages 1685-1694

Compositional and structural properties of deuterated plasma enhanced chemical vapour deposited silicon-carbon alloys

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0007428829     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/13642819908218331     Document Type: Article
Times cited : (9)

References (27)
  • 12
    • 84915301505 scopus 로고
    • Material Research Society Symposium Proceedings, Vol, edited by A. Madan, E. A. SchilT, M. J. Thompson, K. Tanaka and P. G. LeComber (Pittsburgh, Pennsylvania. Material Research Society
    • Gallagher, A., Doyle, J., and Daughty, D., 1989, Amorphous Silicon Technology, Material Research Society Symposium Proceedings, Vol. 149, edited by A. Madan, E. A. SchilT, M. J. Thompson, K. Tanaka and P. G. LeComber (Pittsburgh, Pennsylvania. Material Research Society), p. 23.
    • (1989) Amorphous Silicon Technology , vol.149 , pp. 23
    • Gallagher, A.1    Doyle, J.2    Daughty, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.