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Volumn 4, Issue 11, 2004, Pages 2145-2150

Ambipolar charge injection and transport in a single pentacene monolayer island

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; FIELD EFFECT SEMICONDUCTOR DEVICES; GROWTH KINETICS; SEMICONDUCTING FILMS; SILICA; SURFACE ROUGHNESS;

EID: 9644258966     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0487673     Document Type: Article
Times cited : (64)

References (26)
  • 11
    • 9644275859 scopus 로고    scopus 로고
    • note
    • We modified simultaneously a "mechanical" parameter (substrate roughness) and a "physical" parameter (deposition growth) to ensure a large molecular order difference between the two samples. Further experiments are in progress to determine precisely the respective effect of each parameter on the reported results.
  • 12
    • 9644260972 scopus 로고    scopus 로고
    • All images were processed and analyzed using the WS×M software by Nanotec Electronica S. L. (Spain)
    • All images were processed and analyzed using the WS×M software by Nanotec Electronica S. L. (Spain).
  • 13
    • 9644289864 scopus 로고    scopus 로고
    • Since the roughness has to be measured on a small area on the island, the roughness values are less accurate than on the bare substrate where larger surface areas can be used to determine the roughness data
    • Since the roughness has to be measured on a small area on the island, the roughness values are less accurate than on the bare substrate where larger surface areas can be used to determine the roughness data.
  • 15
    • 9644301453 scopus 로고    scopus 로고
    • note
    • A correction is required because we used a semiconductor substrate instead of a metal. However, this correction can be neglected when using the ratio method, because almost the same correction factor applies in the capacitive and charge gradient forces. See ref 14.
  • 16
    • 9644269415 scopus 로고    scopus 로고
    • note
    • According to the calculation of the factor g given in ref 14, the increase in the factor g reflects the decrease in the island charge screening when a thin insulating layer is inserted between the pentacene island and the silicon.
  • 20
    • 0011336568 scopus 로고    scopus 로고
    • and references therein
    • To our knowledge, the interfacial dipole at the pentacene-Pt/Ir interface has not been measured by photoemission spectroscopy as in other metal/organic systems. However, such a value of about 1 eV is not unreasonable and it has been observed for various interfaces: Au/Alq3, Au/NPD, Au/TPD, and Au/DPNTCI, for example. Alq3 = tri(8-hydroxyquinolino)aluminium, NPD = N,N'-diphenyl-N.N'- bis(1-naphthyl)-l,1'-biphenyl-4,4'-diamine, TPD = N,N'-diphenyl-N,N'-(3- methylphenyl)-1,1'-biphenyl-4,4'-diamine, DP-NTCI = N,N'-diphenyl-1,4,5,8- naphthyltetracarboxilicimide. See a review in Ishii, H.; Sugiyama, K.; Ito, E.; Seki, K. Adv. Mater. 1999, 11, 605-625, and references therein.
    • (1999) Adv. Mater. , vol.11 , pp. 605-625
    • Ishii, H.1    Sugiyama, K.2    Ito, E.3    Seki, K.4
  • 21
    • 9644254682 scopus 로고    scopus 로고
    • This may be due to a lower chemical quality of the pentacene batch used for sample II, Chemicals were used as received
    • This may be due to a lower chemical quality of the pentacene batch used for sample II, Chemicals were used as received.
  • 22
    • 9644292012 scopus 로고    scopus 로고
    • Sample II, we used a native oxide, 1.5 to 2 nm thick. In sample I, to have a better controlled quality of the oxide surface (smoother surface), we used a microelectronics grade thermal oxide with a thickness of 4 nm
    • In sample II, we used a native oxide, 1.5 to 2 nm thick. In sample I, to have a better controlled quality of the oxide surface (smoother surface), we used a microelectronics grade thermal oxide with a thickness of 4 nm.
  • 24
    • 2942534980 scopus 로고    scopus 로고
    • The lateral resolution is proportional to the tip - substrate distance. Its value can be inferred from the comparison of a topographic profile and the EFM profile of charged silicon small nanoparticles using similar equipment and measurement conditions; see Melin, T. et al., Phys. Rev. Lett. 2004, 92, 166101.
    • (2004) Phys. Rev. Lett. , vol.92 , pp. 166101
    • Melin, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.