Synthesis of novel P-type nanocrystalline Si prepared from SiH 2Cl2 and SiCl4 for window layer of thin film Si solar cell

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 9 A, 2004, Pages 5960-5966

  Ikeda, Yoshie ^a   Ito, Tetsuji ^a   Yali, L I ^a   Yamazaki, Michiaki ^a   Hasegawa, Yasuhiro ^b   Shirai, Hajime ^a  

^a Tokyo Denki University   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

B 2h6; Low optical absorption; Nc Si:H:(Cl); SiCl4; SiH2Cl 2

Indexed keywords

ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; LIGHT ABSORPTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SILICON; SILICON COMPOUNDS; SOLAR CELLS; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS;

B2H6; LOW OPTICAL ABSORPTION; NC-SI:H:(CL); SICL4; SIH2CL2;

NANOSTRUCTURED MATERIALS;

EID: 9244224138     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5960     Document Type: Article

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