Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials

Thin Solid Films

Volumn 457, Issue 1, 2004, Pages 90-96

  Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

Nanocrystalline silicon; Plasma enhanced chemical vapor deposition (PE CVD); SiCl4; SiH2Cl2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; OXIDATION; PARAMAGNETIC RESONANCE; PHASE TRANSITIONS; PLASMAS; PRESSURE EFFECTS; RAMAN SPECTROSCOPY; SILICON;

NANOCRYSTALLINE SILICON; SICL4; SIH2CL2;

THIN FILMS;

EID: 2442543150     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.021     Document Type: Conference Paper

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