Advanced processing techniques for silicon carbide MEMS and NEMS

Materials Science Forum

Volumn 457-460, Issue II, 2004, Pages 1451-1456

  Zorman, C A ^a   Mehregany, M ^a  

^a Case Western Reserve University   (United States)

Author keywords

3C SiC; APCVD; LPCVD; MEMS; NEMS; Poly SiC; Surface micromachining

Indexed keywords

ETCHING; MICROMACHINING; NANOTECHNOLOGY; NATURAL FREQUENCIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SINGLE CRYSTALS; STOICHIOMETRY; THIN FILMS;

3C-SIC; APCVD; LPCV; MICROELECTROMECHANICAL SYSTEM (MEMS); NANOELECTROMECHANICAL SYSTEMS (NEMS); POLY-SIC;

MICROELECTROMECHANICAL DEVICES;

EID: 8744269611     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.457-460.1451     Document Type: Conference Paper

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