Development of a multilayer SiC surface micromachining process with capabilities and design rules comparable to conventional polysilicon surface micromachining

Materials Science Forum

Volumn 389-393, Issue 1, 2002, Pages 755-758

  Song, X ^a   Rajgopal, S ^b   Melzak, J M ^b   Zorman, C A ^a   Mehregany, M ^a  

^a Case Western Reserve University   (United States)

^b FLX Micro   (United States)

Author keywords

APCVD; Low pressure CVD; MEMS; Micromolding; Poly SiC; Surface micromachining

Indexed keywords

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MEMS; MULTILAYERS; POLYSILICON; SILICON CARBIDE; DRY ETCHING; ELECTROMECHANICAL DEVICES; MOLDING; POLYCRYSTALLINE MATERIALS; SILICA; SILICON OXIDES; SURFACE MICROMACHINING; URANIUM COMPOUNDS;

MICROMOLDING PROCESS; MULTILAYER DEVICE FABRICATION; POLYSIC; APCVD; LOW PRESSURE CVD; MICRO ELECTROMECHANICAL SYSTEM (MEMS); MICROMOLDING; POLY-SIC; POLYSILICON SURFACE-MICROMACHINING; SURFACE MICROMACHINED STRUCTURE; SURFACE MICROMACHINING PROCESS;

SURFACE MICROMACHINING; NITROGEN COMPOUNDS;

EID: 8744300169     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.389-393.755     Document Type: Article

References (4)

1. M. Mehregany, C.A. Zorman, S. Roy, A.J. Fleischman, C-H. Wu and N. Rajan, Internat. Mat. Rev. 45 (2000), p. 85.
2. A.A. Yasseen, C.A. Zorman, M. Mehregany, J. MEMS 8 (1999), p. 237.
3. A.A. Yasseen, C-H. Wu, C. Zorman, M. Mehregany, Electron Dev. Lett. 21 (2000), p. 164.
4. C.A. Zorman, A.J. Fleischman, A.S. Dewa, M. Mehregany, C. Jacob, S. Nishino, P. Pirouz, J. Appl. Phys. 78 (1995), p. 5136.