SCOPUS 정보 검색 플랫폼

Volumn 6, Issue 22, 2018, Pages 10206-10216

CVD-grown copper tungstate thin films for solar water splitting

(17) Peeters, D a Mendoza Reyes, O b Mai, L a Sadlo, A a Cwik, S a Rogalla, D a Becker, H W a Schutz H M b Hirst, J c Muller S c Friedrich, D c Mitoraj, D b Nagli, M d Toroker, M Caspary d Eichberger, R c Beranek, R b Devi, A a

a RUHR UNIVERSITY BOCHUM (Germany)

b UNIVERSITY OF ULM (Germany)

c HAHN MEITNER INSTITUT (Germany)

d TECHNION ISRAEL INSTITUTE OF TECHNOLOGY (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CHEMICAL VAPOR DEPOSITION; COPPER OXIDES; DEPOSITS; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; OXIDE FILMS; TUNGSTEN COMPOUNDS;

CHEMICAL VAPOR DEPOSITIONS (CVD); FIRST-PRINCIPLES CALCULATION; PERFORMANCE LIMITING FACTOR; PHOTOCATALYTIC WATER SPLITTING; PHOTOELECTROCATALYTIC; PHOTOELECTROCHEMICALS; SOLAR WATER SPLITTING; TIME-RESOLVED MICROWAVE CONDUCTIVITIES;

THIN FILMS;

EID: 85048233756 PISSN: 20507488 EISSN: 20507496 Source Type: Journal
DOI: 10.1039/c7ta10759e Document Type: Article

Times cited : (27)

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- (1977) J. Appl. Phys. , vol.48 , pp. 1914-1920
- Butler, M.A.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.