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Volumn 115, Issue 51, 2011, Pages 25490-25495

Effect of thermal treatment on the crystallographic, surface energetics, and photoelectrochemical properties of reactively cosputtered copper tungstate for water splitting

Author keywords

[No Author keywords available]

Indexed keywords

AIR MASS; AMORPHOUS THIN FILMS; COPPER TUNGSTATE; FLAT BAND; INDIRECT BAND GAP; N-TYPE CONDUCTIVITY; PHOTOCURRENT DENSITY; PHOTOELECTROCHEMICAL PERFORMANCE; PHOTOELECTROCHEMICAL PROPERTIES; PHOTORESPONSES; POLYCRYSTALLINE; POST DEPOSITION TREATMENT; POST-DEPOSITION; SATURATED CALOMEL ELECTRODE; SURFACE ENERGETICS; TEST CONDITION; WATER SPLITTING;

EID: 84255214176     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp207341v     Document Type: Article
Times cited : (78)

References (33)
  • 33
    • 84855561734 scopus 로고    scopus 로고
    • Technical Plan: Hydrogen Production, Multi-Year Research, Development and Demonstration Plan: Planned Program Activities for 2005-2015, U.S. Department of Energy.
    • Technical Plan: Hydrogen Production, Multi-Year Research, Development and Demonstration Plan: Planned Program Activities for 2005-2015, U.S. Department of Energy, 2007; http://www1.eere.energy.gov/hydrogenandfuelcells/mypp/pdfs/ production.pdf.
    • (2007)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.