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Volumn 16, Issue , 2017, Pages 49-52

Cold plasma: background, applications and current trends

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[No Author keywords available]

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EID: 85028004258     PISSN: 22147993     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cofs.2017.07.008     Document Type: Review
Times cited : (156)

References (28)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.