-
1
-
-
0036467912
-
-
J. Fritsche, D. Kraft, A. Thißen, T. Mayer, A. Klein, and, W. Jaegermann, Thin Solid Films 403-404, 252-257 (2002).
-
(2002)
Thin Solid Films
, vol.403-404
, pp. 252-257
-
-
Fritsche, J.1
Kraft, D.2
Thißen, A.3
Mayer, T.4
Klein, A.5
Jaegermann, W.6
-
2
-
-
0005233162
-
-
M. Pfeiffer, K. Leo, and, N. Karl, J. Appl. Phys. 80 (12), 6880-6883 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, Issue.12
, pp. 6880-6883
-
-
Pfeiffer, M.1
Leo, K.2
Karl, N.3
-
3
-
-
73849152785
-
-
C. Hein, E. Mankel, T. Mayer, and, W. Jaegermann, Phys. Status Solidi A 206 (12), 2757-2762 (2009).
-
(2009)
Phys. Status Solidi A
, vol.206
, Issue.12
, pp. 2757-2762
-
-
Hein, C.1
Mankel, E.2
Mayer, T.3
Jaegermann, W.4
-
5
-
-
31344433515
-
-
V. Palermo, M. Palma, and, P. Samor, Adv. Mater. 18 (2), 145-164 (2006).
-
(2006)
Adv. Mater.
, vol.18
, Issue.2
, pp. 145-164
-
-
Palermo, V.1
Palma, M.2
Samor, P.3
-
7
-
-
2942620527
-
-
H. Ishii, N. Hayashi, E. Ito, Y. Washizu, K. Sugi, Y. Kimura, M. Niwano, Y. Ouchi, and, K. Seki, and Phys. Status Solidi A 201 (6), 1075-1094 (2004).
-
(2004)
Phys. Status Solidi A
, vol.201
, Issue.6
, pp. 1075-1094
-
-
Ishii, H.1
Hayashi, N.2
Ito, E.3
Washizu, Y.4
Sugi, K.5
Kimura, Y.6
Niwano, M.7
Ouchi, Y.8
Seki, K.9
-
8
-
-
18644369235
-
-
N. Hayashi, H. Ishii, Y. Ouchi, and, K. Seki, J. Appl. Phys. 92 (7), 3784-3793 (2002).
-
(2002)
J. Appl. Phys.
, vol.92
, Issue.7
, pp. 3784-3793
-
-
Hayashi, N.1
Ishii, H.2
Ouchi, Y.3
Seki, K.4
-
9
-
-
77649273416
-
-
C. Hein, E. Mankel, T. Mayer, and, W. Jaegermann, Sol. Energy Mater. Sol. Cells 94 (4), 662-667 (2010).
-
(2010)
Sol. Energy Mater. Sol. Cells
, vol.94
, Issue.4
, pp. 662-667
-
-
Hein, C.1
Mankel, E.2
Mayer, T.3
Jaegermann, W.4
-
10
-
-
79960641912
-
-
I. Lange, J. C. Blakesley, J. Frisch, A. Vollmer, N. Koch, and, D. Neher, Phys. Rev. Lett. 106 (21), 216402 (2011).
-
(2011)
Phys. Rev. Lett.
, vol.106
, Issue.21
, pp. 216402
-
-
Lange, I.1
Blakesley, J.C.2
Frisch, J.3
Vollmer, A.4
Koch, N.5
Neher, D.6
-
11
-
-
68249162225
-
-
O. M. Ottinger, C. Melzer, and, H. von Seggern, J. Appl. Phys. 106 (2), 023704 (2009).
-
(2009)
J. Appl. Phys.
, vol.106
, Issue.2
, pp. 023704
-
-
Ottinger, O.M.1
Melzer, C.2
Von Seggern, H.3
-
13
-
-
84887121065
-
-
P. de Bruyn, A. H. P. van Rest, G. A. H. Wetzelaer, D. M. de Leeuw, and, P. W. M. Phys, Rev. Lett. 111 (18), 186801 (2013).
-
(2013)
Rev. Lett.
, vol.111
, Issue.18
, pp. 186801
-
-
De Bruyn, P.1
Van Rest, A.H.P.2
Wetzelaer, G.A.H.3
De Leeuw, D.M.4
Phys, P.W.M.5
-
14
-
-
19544380397
-
-
D. V. Lang, X. Chi, T. Siegrist, A. M. Sergent, and, A. P. Ramirez, Phys. Rev. Lett. 93, 086802 (2004).
-
(2004)
Phys. Rev. Lett.
, vol.93
, pp. 086802
-
-
Lang, D.V.1
Chi, X.2
Siegrist, T.3
Sergent, A.M.4
Ramirez, A.P.5
-
15
-
-
29144496011
-
-
O. Tal, Y. Rosenwaks, Y. Preezant, N. Tessler, C. K. Chan, and, A. Kahn, Phys. Rev. Lett. 95, 256405 (2005).
-
(2005)
Phys. Rev. Lett.
, vol.95
, pp. 256405
-
-
Tal, O.1
Rosenwaks, Y.2
Preezant, Y.3
Tessler, N.4
Chan, C.K.5
Kahn, A.6
-
16
-
-
33750208626
-
-
M. Fixman, J. Chem. Phys. 70 (11), 4995-5005 (1979).
-
(1979)
J. Chem. Phys.
, vol.70
, Issue.11
, pp. 4995-5005
-
-
Fixman, M.1
-
18
-
-
84872121027
-
-
T. Glaser, S. Beck, B. Lunkenheimer, D. Donhauser, A. Köhn, M. Kröger, and, A. Pucci, Org. Electron. 14 (2), 575-583 (2013).
-
(2013)
Org. Electron.
, vol.14
, Issue.2
, pp. 575-583
-
-
Glaser, T.1
Beck, S.2
Lunkenheimer, B.3
Donhauser, D.4
Köhn, A.5
Kröger, M.6
Pucci, A.7
-
20
-
-
67649467454
-
-
S. Hamwi, J. Meyer, T. Winkler, T. Riedl, and, W. Kowalsky, Appl. Phys. Lett. 94 (25), 253307 (2009).
-
(2009)
Appl. Phys. Lett.
, vol.94
, Issue.25
, pp. 253307
-
-
Hamwi, S.1
Meyer, J.2
Winkler, T.3
Riedl, T.4
Kowalsky, W.5
-
21
-
-
0004005306
-
-
(John, Wiley, & Sons, Inc., Hoboken, New Jersey).
-
S. M. Sze, and, K. K. Ng, Physics of Semiconductor Devices (John, Wiley, & Sons, Inc., Hoboken, New Jersey, 2007).
-
(2007)
Physics of Semiconductor Devices
-
-
Sze, S.M.1
Ng, K.K.2
-
22
-
-
79955718004
-
-
C. H. Kim, O. Yaghmazadeh, D. Tondelier, Y. B. Jeong, Y. Bonnassieux, and, G. Horowitz, J. Appl. Phys. 109, 083710 (2011).
-
(2011)
J. Appl. Phys.
, vol.109
, pp. 083710
-
-
Kim, C.H.1
Yaghmazadeh, O.2
Tondelier, D.3
Jeong, Y.B.4
Bonnassieux, Y.5
Horowitz, G.6
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