Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films

Nanoscale Research Letters

Volumn 7, Issue 1, 2012, Pages

  Hudaya, Chairul ^a,b   Park, Ji Hun ^a,c   Lee, Joong Kee ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b University of Science and Technology (UST)   (South Korea)

^c Korea University   (South Korea)

Author keywords

ECR MOCVD; FTO; Process parameters; Sheet resistance uniformity; Thin film

Indexed keywords

CONDUCTIVE FILMS; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALS; NANOCOMPOSITES; ORGANIC CHEMICALS; ORGANOMETALLICS; PLASTIC BOTTLES; SHEET METAL; SHEET RESISTANCE; TIN OXIDES; TRANSPARENT CONDUCTING OXIDES;

ELECTRICAL RESISTANCES; FLUORINE DOPED TIN OXIDE; FLUORINE-DOPED TIN OXIDE THIN FILMS; IN-PROCESS PARAMETERS; METAL ORGANIC; METAL OXIDE FILM; PROCESS PARAMETERS; WORKING PRESSURES;

THIN FILMS;

EID: 84979500842     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-17     Document Type: Article

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