Thickness uniformity and surface morphology of Fe, Ti, and Hf films produced by filtered pulsed cathodic arc deposition

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 887-892

  Li, L H ^a,b   Lu, Q Y ^a,b   Fu, Ricky K Y ^a   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b BEIHANG UNIVERSITY   (China)

Author keywords

Filtered pulsed cathodic arc deposition; Morphology; Thickness

Indexed keywords

CAVITY RESONATORS; HAFNIUM; PLASMA CONFINEMENT; PLASMAS; SEMICONDUCTOR DOPING; THICKNESS MEASUREMENT; TITANIUM;

ATOMIC DIFFUSIONS; CURVED DUCTS; DEPOSITION PARAMETERS; FILTERED PULSED CATHODIC ARC DEPOSITION; MORPHO-LOGIES; PULSED CATHODIC ARCS; THICKNESS; THICKNESS OF FILMS; THICKNESS UNIFORMITIES; TI FILMS;

DEPOSITION;

EID: 55749096377     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.026     Document Type: Article

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