Uniformity of deposited film thickness on a uneven surface by direct simulation Monte Carlo

Materials Chemistry and Physics

Volumn 48, Issue 1, 1997, Pages 82-89

  Hong, Lung Chang ^a   Hsu, Chi Chung ^a   Tsai, Dah Shyang ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Chemical vapor deposition; Direct simulation Monte Carlo; Rectangular and wide mouth trench; Sticking coefficient

Indexed keywords

ACTIVATION ANALYSIS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; MONTE CARLO METHODS; SILICON CARBIDE; SURFACE PHENOMENA;

DIRECT SIMULATION MONTE CARLO METHODS (DSMC); STICKING COEFFICIENT; TRENCHES;

FILM GROWTH;

EID: 0031097583     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(97)80083-1     Document Type: Article

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