SCOPUS 정보 검색 플랫폼

AIP Advances

Volumn 6, Issue 7, 2016, Pages

Design criteria for XeF2 enabled deterministic transformation of bulk silicon (100) into flexible silicon layer

(3) Hussain, Aftab M a Shaikh, Sohail F a Hussain, Muhammad M a

a KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DESIGN; EFFICIENCY; FLEXIBLE ELECTRONICS; METALS; MOS DEVICES; OXIDE SEMICONDUCTORS; SILICON; XENON;

COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; FITTING PARAMETERS; ISOTROPIC ETCHING; NUMBER OF CYCLES; REACTION EFFICIENCY; RECTANGULAR DISTRIBUTIONS; STATE OF THE ART; XENON DIFLUORIDE;

SEMICONDUCTING SILICON;

EID: 84978676899 PISSN: None EISSN: 21583226 Source Type: Journal
DOI: 10.1063/1.4959193 Document Type: Article

Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.