Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries

Chemistry of Materials

Volumn 28, Issue 10, 2016, Pages 3435-3445

  Dobbelaere, Thomas ^a   Mattelaer, Felix ^a   Dendooven, Jolien ^a   Vereecken, Philippe ^b   Detavernier, Christophe ^a  

^a GHENT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS MATERIALS; ATOMIC LAYER DEPOSITION; CARBON; CARBON FILMS; DEPOSITION; ELECTRODES; LITHIUM; LITHIUM ALLOYS; MINIATURE BATTERIES; SPECTROSCOPIC ELLIPSOMETRY;

ELECTROCHEMICAL LITHIATION; LITHIUM ION MICROBATTERIES; MICROSTRUCTURED SUBSTRATES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POSITIVE ELECTRODES; SUBSTRATE TEMPERATURE; TERT-BUTYLFERROCENE; TRIMETHYL PHOSPHATE;

THIN FILM LITHIUM ION BATTERIES;

EID: 84973102541     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/acs.chemmater.6b00853     Document Type: Article

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