An iron(II) diketonate-diamine complex as precursor for thin film fabrication by atomic layer deposition

Applied Surface Science

Volumn 347, Issue , 2015, Pages 861-867

  Bratvold, Jon E ^a   Carraro, Giorgio ^b   Barreca, Davide ^b   Nilsen, Ola ^a  

^a UNIVERSITY OF OSLO   (Norway)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Atomic layer deposition; Fe(hfa) 2 TMEDA; Hybrid organic inorganic materials; Molecular layer deposition

Indexed keywords

AMINES; ATOMS; FOURIER SERIES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEMATITE; ORGANIC-INORGANIC MATERIALS; OXALIC ACID; QUARTZ CRYSTAL MICROBALANCES; SELF ASSEMBLY; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAZING-INCIDENCE X-RAY DIFFRACTION; HYBRID ORGANIC-INORGANIC MATERIALS; MOLECULAR LAYER DEPOSITION; ORGANIC-INORGANIC HYBRID MATERIALS; SITU QUARTZ CRYSTAL MICROBALANCE; TETRAMETHYLETHYLENEDIAMINE; THIN FILM FABRICATION; VAPORIZATION RATE;

ATOMIC LAYER DEPOSITION;

EID: 84963732373     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.04.154     Document Type: Article

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