Study of Schottky barrier height modulation for NiSi/Si contact with an antimony interlayer

Microelectronic Engineering

Volumn 106, Issue , 2013, Pages 121-124

  Guo, Xiao ^a   Tang, Yang ^a   Jiang, Yu Long ^a   Qu, Xin Ping ^a   Ru, Guo Ping ^a   Zhang, David Wei ^a   Deduytsche, Davy ^b   Detavernier, Christophe ^b  

^a FUDAN UNIVERSITY   (China)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

Antimony interlayer; SBH modulation; Si(1 1 0) substrate

Indexed keywords

MODULATION; NICKEL; RAPID THERMAL ANNEALING; SCHOTTKY BARRIER DIODES; SILICIDES; SILICON; SUBSTRATES;

BARRIER HEIGHTS; SCHOTTKY BARRIER HEIGHT MODULATION; SCHOTTKY BARRIER HEIGHTS; SCHOTTKY CONTACTS; SI SUBSTRATES; SI(1 0 0);

SEMICONDUCTOR METAL BOUNDARIES;

EID: 84962625455     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2013.01.006     Document Type: Conference Paper

References (17)

1. J.M. Larson, and J.P. Snyder IEEE Trans. Electron Dev. 53 2006 1048 1058
2. K. Maex, and M.V. Rossum IMEC Handbook of Properties of Metal Silicides 1995 INSPEC England 165
3. Z. Zhang, Z.-J. Qiu, R. Liu, M. Östling, and S.L. Zhang IEEE Electron Dev. Lett. 28 2007 565 568
4. H.-S. Wong, L. Chan, G. Samudra, and Y.-C. Yeo IEEE Electron Dev. Lett. 28 2007 703 705
5. P. Packan, S. Cea, H. Deshpande, T. Ghani, M. Giles, O. Golonzka, M. Hattendorf, R. Kotlyar, K. Kuhn, A. Murthy, P. Ranade, L. Shifren, C. Weber, and K. Zawadzki IEDM Tech. Dig. 2008 63
6. K. Maex, and M.V. Rossum IMEC Handbook of Properties of Metal Silicides 1995 INSPEC England 283
7. M.R. Goldwasser, D. Rojas, and J. Goldwasser J. Catal. 135 1992 596 608
8. K. Maex, and M.V. Rossum IMEC Handbook of Properties of Metal Silicides 1995 INSPEC England 57
9. P. Kringhøj, A.N. Larsen, and S.Y. Shirayev Phys. Rev. Lett 76 1996 3372 3375
10. R.B. Fair, M.L. Manda, and J.J. Wortman J. Mater. Res. 1 1986 705 711
11. O. Sugino, and A. Oshiyama Phys. Rev. B 46 1992 12335 12341
12. P. Fahey, P.B. Griffin, and J.D. Plummer Rev. Mod. Phys. 61 1989 289
13. S.S. Lau, Z.L. Liau, and M.-A. Nicolet Thin Solid Films 47 1977 313 322
14. J.S. Williams, and R.G. Elliman Appl. Phys. Lett. 40 1982 266 268
15. A. Kinoshita, Y. Tsuchiya, A. Yagishita, K. Uchida, J. Koga, in: Sym. on VLSI Tech., Dig. Tech., 2004, p. 168.
16. X. Guo, H. Yu, Y.L. Jiang, G.-P. Ru, D.W. Zhang, and B.Z. Li Appl. Surf. Sci. 257 2011 10571 10575
17. C.Y. Chang, and S.M. Sze Solid State Electron. 13 1970 727 740