Growth of SiC as Binder to Adhere Diamond Particle and Tribological Properties of Diamond Particles Coated SiC

Journal of Materials Science and Technology

Volumn 31, Issue 11, 2015, Pages 1133-1138

  Yu, Shengjie ^a   Chen, Zhaofeng ^a   Wang, Yang ^a   Hu, Shuwei ^a   Luo, Ruiying ^b   Cui, Sheng ^c  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

^b BEIHANG UNIVERSITY   (China)

^c NANJING TECH UNIVERSITY   (China)

Author keywords

Diamond particle; LPCVD (low pressure chemical vapor deposition); SiC; Tribological performance

Indexed keywords

CHEMICAL BONDS; CHLORINE COMPOUNDS; COMPOSITE COATINGS; FRICTION; GRAPHITE; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PROTACTINIUM; SILICON; SILICON CARBIDE; SILICON COMPOUNDS; SUBSTRATES; SULFUR COMPOUNDS; SURFACE MORPHOLOGY; TRIBOLOGY; WEAR OF MATERIALS;

DIAMOND PARTICLES; FRICTION COEFFICIENTS; GRAPHITE SUBSTRATE; INTERFACIAL BONDING; LPCVD (LOW PRESSURE CHEMICAL VAPOR DEPOSITION); METHYLTRICHLOROSILANE; TRIBOLOGICAL PERFORMANCE; TRIBOLOGICAL PROPERTIES;

DIAMONDS;

EID: 84947491648     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmst.2015.07.009     Document Type: Article

References (21)

1. Buhl S., Leinenbach C., Spolenak R., Wegener K. J. Mater. Sci 2010, 45:4358-4368.
2. Fissel A. Phys. Rep 2003, 379:149-255.
3. Matsunami H., Kimoto T. Mater. Sci. Eng. R 1997, 20:125-166.
4. Ekimov E.A., Gavriliuk A.G. Appl. Phys. Lett 2000, 77:954-956.
5. Qian J., Voronin G., Zerda T.W. J. Mater. Res 2002, 17:2153-2160.
6. Leparoux S., Diot C., Dubach A., Vaucher S. Scripta Mater 2007, 57:595-597.
7. Voronin G.A., Pantea C., Zerda T.W., Ejsmont K. J. Appl. Phys 2001, 90:5933-5935.
8. Klotz U.E., Liu C., Khalid F.A., Elsener H.R. Mater. Sci. Eng. A 2008, 495:265-270.
9. Leech P.W., Li X.S. Wear 2011, 271:1244-1251.
10. Ma B.J., Lian F. Int. J. Refract. Met. Hard Mater 2013, 41:339-344.
11. Ma B.J., Pang Q., Lou J.P. Int. J. Refract. Met. Hard Mater 2014, 43:25-29.
12. Venkateswarlu K., Rajinikanth V., Naveen T., Sinha D.P., Atiquzzaman, Ray A.K. Wear 2009, 266:995-1002.
13. Daves W., Krauss A., Behnel N., Häublein V. Thin Solid Films 2011, 519:5892-5898.
14. Zuo X.Z., Zhang L.T., Liu Y.S., Li S.W., Cheng L.F. J. Mater. Sci. Technol 2012, 28:793-798.
15. Xu Y.D., Cheng L.F., Zhang L.T. J. Mater. Process. Technol 2000, 101:47-51.
16. Y.V. Naidich, B.P. Umanski, I.A. Lavrinenko, Naukova Dumka, Kiev, 1988, pp. 1-136.
17. Kim H.S., Choi D.J. J. Am. Ceram. Soc 1999, 82:331-337.
18. Xu Y., Cheng L., Zhang L., Zhou W. J. Mater. Sci 1999, 34:551-555.
19. Reeber R.R., Wang K. J. Electron. Mater 1996, 25:63-67.
20. Tang S., Deng J., Liu W., Yang K. Carbon 2006, 44:2877-2882.
21. Chu M.C., Cho S.J., Park H.M., Yoon K.J., Ryu H. Mater. Lett 2004, 58:1313-1316.