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Volumn 2, Issue , 2003, Pages 494-497

Mechanical aspects of nanoimprint patterning

Author keywords

Displacement control; Force measurement; Geometry; Heat transfer; Ion beams; Mechanical factors; Mechanical variables measurement; Nanopatterning; Polymer films; Temperature control

Indexed keywords

DEFORMATION; DISPLACEMENT CONTROL; FORCE MEASUREMENT; GEOMETRY; GLASS TRANSITION; HEAT TRANSFER; ION BEAMS; MECHANICAL VARIABLES MEASUREMENT; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; POLYMERS; SEMICONDUCTING FILMS; TEMPERATURE CONTROL; THIN FILMS;

EID: 84943628270     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2003.1230954     Document Type: Conference Paper
Times cited : (11)

References (8)
  • 1
    • 0030570065 scopus 로고    scopus 로고
    • Imprint lithography with 25-nanometer resolution
    • S. Y. Chou, P. R. Krauss, and P. J. Renstrom. Imprint lithography with 25-nanometer resolution. Science, 272:85-87, 1996.
    • (1996) Science , vol.272 , pp. 85-87
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 2
    • 0037142072 scopus 로고    scopus 로고
    • Ultrafast and direct imprint of nanostructures in silicon
    • S. Y. Chou, C. Keimel, and J. Gu. Ultrafast and direct imprint of nanostructures in silicon. Nature, 417:835-837, 2002.
    • (2002) Nature , vol.417 , pp. 835-837
    • Chou, S.Y.1    Keimel, C.2    Gu, J.3
  • 6
    • 0035422490 scopus 로고    scopus 로고
    • A contribution to the flow behaviour of thin polymer films during hot embossing lithography
    • H. C. Scheer and H. Schulz. A contribution to the flow behaviour of thin polymer films during hot embossing lithography. Microelect. Eng., 56:311-332, 2001.
    • (2001) Microelect. Eng. , vol.56 , pp. 311-332
    • Scheer, H.C.1    Schulz, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.