Quantitative analysis of Ni 2p photoemission in NiO and Ni diluted in a SiO2 matrix

Surface Science

Volumn 644, Issue , 2016, Pages 46-52

  Pauly, N ^a   Yubero, F ^b   Garcia Garcia F J ^b   Tougaard, S ^c  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b UNIVERSITY OF SEVILLE   (Spain)

^c UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

Author keywords

Core hole effect; Nickel oxide; Non local screening effect; Photoelectron spectroscopy; Surface effect; XPS

Indexed keywords

DISSOCIATION; ELECTRON ENERGY ANALYZERS; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRON TRANSPORT PROPERTIES; ELECTRONS; ENERGY DISSIPATION; EXCITED STATES; NICKEL OXIDE; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTOEMISSION; PHOTONS; SPECTRUM ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CORE HOLE; ELECTRON ENERGY LOSS SPECTRUM; INELASTIC ELECTRON SCATTERING CROSS SECTIONS; PHOTO-EXCITATION PROCESS; QUANTITATIVE INTERPRETATION; REACTIVE MAGNETRON SPUTTERING; SCREENING EFFECT; SURFACE EFFECT;

NICKEL;

EID: 84943619145     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2015.09.012     Document Type: Article

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