Reliability comparison of Al2O3 and HfSiON for use as interpoly dielectric in flash arrays

ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference

Volumn , Issue , 2006, Pages 234-237

  Miranda, Almudena Huerta ^a   Van Schaijk, Rob ^a   Van Duuren, Michiel ^a   Akil, Nader ^a   Golubović, Dušan S ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CMOS INTEGRATED CIRCUITS; DATA ACQUISITION; RELIABILITY ANALYSIS;

FLASH ARRAYS; TEMPERATURE DATA RETENTION; TUNNEL BARRIERS;

FLASH MEMORY;

EID: 84943197764     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2006.307681     Document Type: Conference Paper

References (8)

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