Optical properties of UV-transparent aluminum oxide / aluminum fluoride mixture films, prepared by plasma-ion assisted evaporation and ion beam sputtering

Optical Materials Express

Volumn 4, Issue 8, 2014, Pages 1696-1707

  Stenzel, Olaf ^a   Wilbrandt, Steffen ^a   Du, Shan ^a,b   Franke, Christian ^a,b   Kaiser, Norbert ^a   Tünnermann, Andreas ^a,b   Mende, Mathias ^c,d   Ehlers, Henrik ^d   Held, Mario ^b,e  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^c Laseroptik GmbH   (Germany)

^d LASER ZENTRUM HANNOVER E V   (Germany)

^e OptoTech Optikmaschinen GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; EVAPORATION; FLUORINE COMPOUNDS; ION BEAMS; IONS; MIXTURES; OPTICAL COATINGS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; PHYSICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SPUTTERING; STRESSES; ULTRAVIOLET SPECTROSCOPY;

ALUMINUM FLUORIDE; ELECTRON BEAM EVAPORATION; EXTINCTION COEFFICIENTS; ION-BEAM SPUTTERING; MECHANICAL STRESS; PLASMA ION-ASSISTED EVAPORATION; ULTRAVIOLET SPECTRAL RANGE; VAPOR-DEPOSITION TECHNIQUES;

ALUMINUM COATINGS;

EID: 84942035346     PISSN: None     EISSN: 21593930     Source Type: Journal    
DOI: 10.1364/OME.4.001696     Document Type: Article

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