The correlation between mechanical stress, thermal shift and refractive index in HfO2, Nb2O5, Ta2O5 and SiO2 layers and its relation to the layer porosity

Thin Solid Films

Volumn 517, Issue 21, 2009, Pages 6058-6068

  Stenzel, O ^a   Wilbrandt, S ^a   Kaiser, N ^a   Vinnichenko, M ^b   Munnik, F ^b   Kolitsch, A ^b   Chuvilin, A ^c   Kaiser, U ^c   Ebert, J ^d   Jakobs, S ^e   Kaless, A ^e   Wuthrich S ^f   Treichel, O ^g   Wunderlich, B ^h   Bitzer, M ^h   Grossl M ⁱ  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c UNIVERSITY OF ULM   (Germany)

^d Laseroptik GmbH   (Germany)

^e Mso Jena Mikroschichtoptik GmbH   (Germany)

^f Evatec Ltd   (Switzerland)

^g S1 Optics GmbH   (Germany)

^h Fresnel Optics GmbH   (Germany)

ⁱ R+D FISBA OPTIK AG   (Switzerland)

Author keywords

Optical coatings; Optical properties; Stress; Structural properties

Indexed keywords

COATING MATERIAL; ELECTRON BEAM EVAPORATION; EXPERIMENTAL DATA; EXPERIMENTAL MATERIALS; ION PLATING; LAYER STRUCTURES; MECHANICAL COATINGS; MECHANICAL STRESS; PLASMA ION-ASSISTED EVAPORATION; PORE FRACTION; THERMAL SHIFT;

ELECTRON BEAMS; EVAPORATION; HAFNIUM COMPOUNDS; ION IMPLANTATION; LIGHT REFRACTION; MECHANICAL PROPERTIES; NIOBIUM; OPTICAL COATINGS; OPTICAL MATERIALS; PLATING; POROSITY; REFRACTIVE INDEX; REFRACTOMETERS; SILICON COMPOUNDS; TANTALUM; VAPORS;

STRESSES;

EID: 63749083512     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.05.009     Document Type: Article

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