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Volumn 47, Issue 13, 2008, Pages

Characterization of low losses in optical thin films and materials

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; FILMS; FLUORESCENCE; LASER BEAM EFFECTS; LASER EXCITATION; OPTICAL COATINGS;

EID: 50849096744     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C135     Document Type: Article
Times cited : (59)

References (11)
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    • Eva, E.1    Mann, K.2
  • 2
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    • 0000203530 scopus 로고    scopus 로고
    • Novel method to measure bulk absorption in optically transparent materials
    • M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000).
    • (2000) Rev. Sci. Instrum , vol.71 , pp. 2279-2282
    • Guntau, M.1    Triebel, W.2
  • 4
    • 33244473714 scopus 로고    scopus 로고
    • Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings
    • W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005).
    • (2005) Proc. SPIE , vol.5965
    • Triebel, W.1    Mühlig, C.2    Kufert, S.3
  • 5
    • 34247354185 scopus 로고    scopus 로고
    • Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications
    • Ch. Mühlig W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007).
    • (2007) Proc. SPIE , vol.6403 , pp. 640317
    • Mühlig, C.1    Triebel, W.2    Kufert, S.3    Noppeney, C.4    Bernitzki, H.5
  • 7
    • 0042361876 scopus 로고    scopus 로고
    • Calcium fluoride for ArF laser lithography-characterization by in situ transmission and LIF measurements
    • Ch. Mühlig, W. Triebel, G. Töpfer and A. Jordanov, "Calcium fluoride for ArF laser lithography-characterization by in situ transmission and LIF measurements," Proc. SPIE, 4932, 458-466 (2003).
    • (2003) Proc. SPIE , vol.4932 , pp. 458-466
    • Mühlig, C.1    Triebel, W.2    Töpfer, G.3    Jordanov, A.4
  • 8
    • 34247381173 scopus 로고    scopus 로고
    • Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)
    • project EU-2359, VDI Technology Center
    • U. Natura, Ch. Mühlig W. Triebel, Ch. Görling U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.
    • (2003) CHOCLAB II -Brochure to the final presentation of the Eureka , pp. 280-294
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  • 9
    • 0000836145 scopus 로고    scopus 로고
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.