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Volumn 142, Issue , 2015, Pages 29-33

Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

Author keywords

Al2O3; Atomic Layer Deposition; Nano texturing; Negative charge; Reactive ion etching; Surface passivation

Indexed keywords

ALUMINUM; ATOMS; NANOSTRUCTURES; PASSIVATION; REACTIVE ION ETCHING; SILICON;

EID: 84940461584     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2015.05.027     Document Type: Article
Times cited : (65)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.