Microstructure and supercapacitive properties of rf-sputtered copper oxide thin films: influence of O2/Ar ratio

Ionics

Volumn 21, Issue 8, 2015, Pages 2319-2328

  Purusottam Reddy, B ^a   Sivajee Ganesh, K ^a   Jayanth Babu, K ^a   Hussain, O M ^a   Julien, C M ^b,c  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b SORBONNE UNIVERSITÉ   (France)

^c Université Pierre et Marie Curie Tour   (France)

Author keywords

Copper oxide thin films; Microstructure; Sputtering; Supercapacitors

Indexed keywords

CAPACITORS; CHARGE TRANSFER; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYTIC CAPACITORS; FILM PREPARATION; MAGNETRON SPUTTERING; METALLIC COMPOUNDS; MICROSTRUCTURE; OXIDE FILMS; SPUTTERING; STAINLESS STEEL; THIN FILMS;

CHARGE TRANSFER RESISTANCE; COPPER OXIDE THIN FILMS; CYCLIC VOLTAMMETRIC; RF-MAGNETRON SPUTTERING; SPUTTERED COPPER OXIDES; SPUTTERING PRESSURES; STAINLESS STEEL SUBSTRATES; SUPER CAPACITOR;

COPPER;

EID: 84938293263     PISSN: 09477047     EISSN: 18620760     Source Type: Journal    
DOI: 10.1007/s11581-015-1403-5     Document Type: Article

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