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Volumn 76, Issue , 2014, Pages 207-212

Controlling the preferred orientation in sputter-deposited Cu2O thin films: Influence of the initial growth stage and homoepitaxial growth mechanism

Author keywords

Cuprous oxide; Homoepitaxy; Preferred orientation; Reactive sputtering

Indexed keywords

AIR CLEANERS; COPPER; EPITAXIAL GROWTH; HIGH PRESSURE EFFECTS; REACTIVE SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 84901868284     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2014.05.008     Document Type: Article
Times cited : (34)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.