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Volumn 16, Issue 10, 2012, Pages 3383-3390
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Influence of annealing temperature on microstructural and electrochemical properties of rf-sputtered LiMn 2O 4 film cathodes
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Author keywords
Annealing; Electrochemical properties; LiMn 2O 4 thin films; Microstructure; rf sputtering
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Indexed keywords
ANNEALING TEMPERATURES;
AQUEOUS ELECTROLYTE;
CHARACTERISTIC PEAKS;
CUBIC SPINEL STRUCTURE;
DEGREE OF CRYSTALLIZATION;
DISCHARGE CAPACITIES;
ELECTROCHEMICAL PERFORMANCE;
ELECTROCHEMICAL STUDIES;
FILM CATHODES;
GRAIN SIZE;
ION DIFFUSION COEFFICIENT;
MICRO-STRUCTURAL;
MORPHOLOGICAL FEATURES;
POST-DEPOSITION;
POTENTIAL WINDOWS;
RF-SPUTTERING;
ROOT MEAN SQUARE ROUGHNESS;
SPECIFIC DISCHARGE CAPACITY;
X-RAY DIFFRACTION DATA;
CYCLIC VOLTAMMETRY;
DIFFUSION;
ELECTROCHEMICAL PROPERTIES;
LITHIUM ALLOYS;
MANGANESE;
MICROSTRUCTURE;
SCANNING ELECTRON MICROSCOPY;
X RAY DIFFRACTION;
ANNEALING;
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EID: 84868623868
PISSN: 14328488
EISSN: None
Source Type: Journal
DOI: 10.1007/s10008-012-1784-6 Document Type: Article |
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Times cited : (12)
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References (30)
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