NiO/Si heterostructures formed by UV oxidation of nickel deposited on Si substrates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 32, Issue 3, 2014, Pages

  Zhang, Dongyuan ^a   Nozaki, Shinji ^a   Uchida, Kazuo ^a  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIODES; HETEROJUNCTIONS; NICKEL; NICKEL OXIDE; OXIDATION; SECONDARY ION MASS SPECTROMETRY; SILICON;

HETEROJUNCTION DIODES; METAL OXIDE SEMICONDUCTOR; N-TYPE SEMICONDUCTORS; NICKEL OXIDES (NIO); OXIDATION TEMPERATURE; P-TYPE CONDUCTIVITY; PROCESS TECHNOLOGIES; SECONDARY ION MASS SPECTROSCOPY;

SEMICONDUCTOR DIODES;

EID: 84929429295     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4868634     Document Type: Article

References (19)

1. Y.-H. Kim et al., Nature 489, 128 (2012).
2. H. Sato, T. Minami, S. Takata, and T. Yamada, Thin Solid Films 236, 27 (1993).
3. S. Hufner, Adv. Phys. 43, 183 (1994).
4. T. Kamiya, H. Ohta, M. Kamiya, K. Nomura, K. Ueda, M. Hirano, and H. Hosono, J. Mater. Res. 19, 913 (2004).
5. D. Sands, K. M. Brunson, C. B. Thomas, and H. S. Reehal, Appl. Phys. Lett. 51, 21 (1987).
6. S. Nozaki, S. Kimura, A. Koizumi, H. Ono, and K. Uchida, Mater. Semicond. Process. 11, 384 (2008).
7. D. Zhang, K. Uchida, and S. Nozaki, "Metal oxide semiconductors formed by UV oxidation of metallic films" (unpublished).
8. R. Srnanek, I. Hotovy, V. Malcher, A. Vincze, D. McPhail, and S. Littlewood, The Third International EuroConference on Advanced Semiconductor Devices and Microsystems, 2000, pp. 303-306.
9. I. Hatov, D. Buc, S. Hascik, and O. Nennewitz, Vacuum 50, 41 (1998).
10. O. Kohmoto, H. Nakagawa, Y. Isagawa, and A. Chayahara, J. Magn. Magn. Mater. 226-230, 1629 (2001).
11. J. Nayak, J. Kasuya, A. Watanabe, and S. Nozaki, J. Phys.: Condensed Matter 20, 195222 (2008).
12. B. Claflin, D. C. Look, S. J. Park, and G. Gantwell, J. Cryst. Growth 287, 16 (2006).
13. A. Fujimori and F. Minami, Phys. Rev. B 30, 957 (1984).
14. Y. Nishi, T. Iwata, and T. Kimoto, Jpn. J. Appl. Phys. 50, 015802 (2011).
15. J.-M. Choi and S. Im, Appl. Surf. Sci. 244, 435 (2005).
16. M. D. Irwin et al., Chem. Mater. 23, 2218 (2011).
17. C. T. Sah and V. G. K. Reddi, IEEE Trans. Electron Devices ED-11, 345 (1964).
18. A. A. Istratov and E. R. Weber, Appl. Phys. A 66, 123 (1998).
19. H. Ohta, M. Kamiya, T. Kamiya, M. Hirano, and H. Hosono, Thin Solid Films 445, 317 (2003).