Effects of acetylene flow rate and processing temperature on graphene films grown by thermal chemical vapor deposition

Thin Solid Films

Volumn 584, Issue , 2015, Pages 265-269

  Chen, Chih Sheng ^a   Hsieh, Chien Kuo ^a  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Acetylene; Chemical vapor deposition; Graphene; Low temperature

Indexed keywords

ACETYLENE; CARBON FILMS; FIELD EMISSION MICROSCOPES; FLOW OF GASES; GRAPHENE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LIGHTING; PROCESSING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

ACETYLENE FLOW; FEW-LAYER GRAPHENE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GASEOUS MIXTURE; LOW TEMPERATURE CVD; LOW TEMPERATURES; PROCESSING TEMPERATURE; THERMAL CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 84928614383     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.12.012     Document Type: Conference Paper

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