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Volumn 13, Issue 10, 2012, Pages 2544-2549

On the mechanisms of Ni-catalysed graphene chemical vapour deposition

(9) Weatherup, Robert S a Bayer, Bernhard C a Blume, Raoul b Baehtz, Carsten c Kidambi, Piran R a Fouquet, Martin a Wirth, Christoph T a Schlögl, Robert d Hofmann, Stephan a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b HAHN MEITNER INSTITUT (Germany)

c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

d FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT (Germany)

Author keywords

chemical vapor deposition; graphene; nickel; photoelectron spectroscopy; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NICKEL; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; PRECIPITATION (CHEMICAL); X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOUR DEPOSITION; DISSOLVED CARBONS; GRAPHENE GROWTH; NI CATALYSTS; SITU X-RAY PHOTOELECTRON SPECTROSCOPY; SUB-SURFACES; X-RAY DIFFRACTION MEASUREMENTS;

GRAPHENE;

EID: 84863664302 PISSN: 14394235 EISSN: 14397641 Source Type: Journal
DOI: 10.1002/cphc.201101020 Document Type: Article

Times cited : (96)

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