Stoichiometry control of complex oxides by sequential pulsed-laser deposition from binary-oxide targets

Applied Physics Letters

Volumn 106, Issue 13, 2015, Pages

  Herklotz, A ^a,b   Dorr K ^b   Ward, T Z ^a   Eres, G ^a   Christen, H M ^a   Biegalski, M D ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; GROWTH (MATERIALS); MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; PULSED LASERS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STOICHIOMETRY; STRONTIUM COMPOUNDS;

ATOMIC LAYER CONTROL; ELECTRONIC FUNCTIONALITY; PEROVSKITE TYPE OXIDES; RHEED INTENSITY OSCILLATIONS; RUDDLESDEN-POPPER PHASIS; SEQUENTIAL DEPOSITION; STOICHIOMETRY CONTROL; STRUCTURAL QUALITIES;

QUALITY CONTROL;

EID: 84926626103     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4916948     Document Type: Article

References (26)

1. J. Chakhalian, A. J. Millis, and J. Rondinelli, Nat. Mater. 11, 92 (2012). 10.1038/nmat3225
2. J. M. Rondinelli, S. J. May, and J. W. Freeland, MRS Bull. 37, 261 (2012). 10.1557/mrs.2012.49
3. C.-H. Lee, N. D. Orloff, T. Birol, Y. Zhu, V. Goian, E. Rocas, R. Haislmaier, E. Vlahos, J. A. Mundy, L. F. Kourkoutis, Y. Nie, M. D. Biegalski, J. Zhang, M. Bernhagen, N. A. Benedek, Y. Kim, J. D. Brock, R. Uecker, X. X. Xi, V. Gopalan, D. Nuzhnyy, S. Kamba, D. A. Muller, I. Takeuchi, J. C. Booth, C. J. Fennie, and D. G. Schlom, Nature 502, 532 (2013). 10.1038/nature12582
4. J. Haeni, C. Theis, and D. Schlom, J. Electroceram. 4, 385 (2000). 10.1023/A:1009947517710
5. C. M. Brooks, L. F. Kourkoutis, T. Heeg, J. Schubert, D. A. Muller, and D. G. Schlom, Appl. Phys. Lett. 94, 162905 (2009). 10.1063/1.3117365
6. Z. Wang, J. Feng, Y. Yang, Y. Yao, L. Gu, F. Yang, Q. Guo, and J. Guo, Appl. Phys. Lett. 100, 051602 (2012). 10.1063/1.3681796
7. G. Eres, J. Tischler, M. Yoon, B. Larson, C. Rouleau, D. Lowndes, and P. Zschack, Appl. Phys. Lett. 80, 3379 (2002). 10.1063/1.1477279
8. G. Koster, B. L. Kropman, G. J. H. M. Rijnders, D. H. A. Blank, and H. Rogalla, Appl. Phys. Lett. 73, 2920 (1998). 10.1063/1.122630
9. D. Blank, G. Koster, G. Rijnders, E. van Setten, P. Slycke, and H. Rogalla, Appl. Phys. A 69, S17 (1999). 10.1007/s003399900187
10. A. Ohtomo and H. Y. Hwang, J. Appl. Phys. 102, 083704 (2007). 10.1063/1.2798385
11. T. Ohnishi, K. Shibuya, T. Yamamoto, and M. Lippmaa, J. Appl. Phys. 103, 103703 (2008). 10.1063/1.2921972
12. G. Li, J. Guo-Qi, Z. Jin-Gai, L. Qing-Bo, W. Wei, G. Jian-Xin, and D. Xiu-Hong, Chin. Phys. Lett. 30, 047703 (2013). 10.1088/0256-307X/30/4/047703
13. A. Ohtomo and H. Y. Hwang, Nature 427, 423 (2004). 10.1038/nature02308
14. M. D. Biegalski, Y. Jia, D. G. Schlom, S. Trolier-McKinstry, S. K. Streiffer, V. Sherman, R. Uecker, and P. Reiche, Appl. Phys. Lett. 88, 192907 (2006). 10.1063/1.2198088
15. M. C. Tarun, F. A. Selim, and M. D. McCluskey, Phys. Rev. Lett. 111, 187403 (2013). 10.1103/PhysRevLett.111.187403
16. th Workshop on Oxide Electronics (WOE18), Napa Valley, CA, 26-28 September 2011.
17. J. H. Lee, G. Luo, I. C. Tung, S. H. Chang, Z. Luo, M. Malshe, M. Gadre, A. Bhattacharya, S. M. Nakhmanson, J. A. Eastman, H. Hong, J. Jellinek, D. Morgan, D. D. Fong, and J. W. Freeland, Nat. Mater. 13, 879 (2014). 10.1038/nmat4039
18. Y. F. Nie, Y. Zhu, C.-H. Lee, L. F. Kourkoutis, J. A. Mundy, J. Junquera, P. Ghosez, D. J. Baek, S. Sung, X. X. Xi, K. M. Shen, D. A. Muller, and D. G. Schlom, Nat. Commun. 5, 4530 (2014). 10.1038/ncomms5530
19. H. M. Christen and G. Eres, J. Phys.: Condens. Matter 20, 264005 (2008). 10.1088/0953-8984/20/26/264005
20. H. Ledbetter, M. Lei, and S. Kim, Phase Transitions 23, 61 (1990). 10.1080/01411599008241819
21. T. Suzuki, Y. Nishi, and M. Fujimoto, Philos. Mag. A 80, 621 (2000). 10.1080/01418610008212072
22. D. Fuchs, M. Adam, P. Schweiss, S. Gerhold, S. Schuppler, R. Schneider, and B. Obst, J. Appl. Phys. 88, 1844 (2000). 10.1063/1.1305827
23. K. Shibuya, S. Mi, C.-L. Jia, P. Meuffels, and R. Dittmann, Appl. Phys. Lett. 92, 241918 (2008). 10.1063/1.2945640
24. Y. Iwazaki, T. Suzuki, S. Sekiguchi, and M. Fujimoto, Jpn. J. Appl. Phys. Part 2 38, L1443 (1999). 10.1143/JJAP.38.L1443
25. J. H. Haeni, C. D. Theis, D. G. Schlom, W. Tian, X. Q. Pan, H. Chang, I. Takeuchi, and X.-D. Xiang, Appl. Phys. Lett. 78, 3292 (2001). 10.1063/1.1371788
26. M. Okude, A. Ohtomo, T. Kita, and M. Kawasaki, Appl. Phys. Express 1, 081201 (2008). 10.1143/APEX.1.081201