Plasmonic films can easily be better: Rules and recipes

ACS Photonics

Volumn 2, Issue 3, 2015, Pages 326-333

  McPeak, Kevin M ^a   Jayanti, Sriharsha V ^a   Kress, Stephan J P ^a   Meyer, Stefan ^a   Iotti, Stelio ^a   Rossinelli, Aurelio ^a   Norris, David J ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

aluminum; copper; deposition; dielectric function; gold; plasmonics; relative permittivity; silver

Indexed keywords

ALUMINUM; COPPER; DEPOSITION; GOLD; GOLD DEPOSITS; OPTICAL PROPERTIES; PLASMONS; QUANTUM ELECTRONICS; QUANTUM THEORY; SILVER;

DEPOSITION METHODS; DIELECTRIC FUNCTIONS; HIGH-QUALITY MATERIALS; LIMITING PERFORMANCE; PLASMONICS; RELATIVE PERMITTIVITY; SURFACE PLASMONS; THERMAL EVAPORATOR;

ALUMINUM COATINGS;

EID: 84925651883     PISSN: None     EISSN: 23304022     Source Type: Journal    
DOI: 10.1021/ph5004237     Document Type: Article

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