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Volumn 5, Issue 35, 2015, Pages 27449-27457

Evaluation of the Yasuda parameter for the atmospheric plasma deposition of allyl methacrylate

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; COATINGS; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; MONOMERS; MORPHOLOGY; PLASMA APPLICATIONS; PLASMA SOURCES; TUNGSTEN;

EID: 84925422701     PISSN: None     EISSN: 20462069     Source Type: Journal    
DOI: 10.1039/c5ra02684a     Document Type: Article
Times cited : (32)

References (44)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.