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Journal of Applied Physics

Volumn 108, Issue 9, 2010, Pages

Influence of operational parameters on plasma polymerization process at atmospheric pressure

(4) Asandulesa, Mihai a Topala, Ionut a Pohoata, Valentin a Dumitrascu, Nicoleta a

a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; DIELECTRIC BARRIER DISCHARGES; DISCHARGE POWER; HIGH CONCENTRATION; HIGH DEPOSITION RATES; MACROSCOPIC PARAMETERS; OPERATIONAL PARAMETERS; OPTICAL INTERFEROMETRY; OPTIMUM OPERATING CONDITIONS; POLYMER DEPOSITION RATE; POLYMER THIN FILMS; POLYMERIZATION PROCESS; POLYMERIZATION REACTION; POLYSTYRENE FILMS; UV SPECTROSCOPY;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DEPOSITION; DEPOSITION RATES; ELECTRIC DISCHARGES; INFRARED SPECTROSCOPY; PLASMA DEPOSITION; PLASMAS; PLASTIC FILMS; POLYMER FILMS; POLYMERIC FILMS; POLYMERS; POLYSTYRENES; STYRENE; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA POLYMERIZATION;

EID: 78649270481 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3506528 Document Type: Article

Times cited : (27)

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