Post-assembly atomic layer deposition of ultrathin metal-oxide coatings enhances the performance of an organic dye-sensitized solar cell by suppressing dye aggregation

ACS Applied Materials and Interfaces

Volumn 7, Issue 9, 2015, Pages 5150-5159

  Son, Ho Jin ^a,c   Kim, Chul Hoon ^a,f   Kim, Dong Wook ^a   Jeong, Nak Cheon ^a,d   Prasittichai, Chaiya ^a,g   Luo, Langli ^b   Wu, Jinsong ^b   Farha, Omar K ^a,e   Wasielewski, Michael R ^a   Hupp, Joseph T ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

^c Korea University   (South Korea)

^d Daegu Gyeongbuk Institute of Science and Technology   (South Korea)

^e KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

^f POSTECH   (South Korea)

^g KASETSART UNIVERSITY   (Thailand)

Author keywords

atomic layer deposition (ALD); dye aggregation; dye sensitized solar cells (DSCs); interfacial electron injection; post treatment

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMS; CONVERSION EFFICIENCY; DYE-SENSITIZED SOLAR CELLS; ELECTRON INJECTION; EXCITED STATES; METALS; ORGANIC SOLAR CELLS; OXIDE MINERALS; PROTECTIVE COATINGS; TITANIUM DIOXIDE;

CHENODEOXYCHOLIC ACID; CONCOMITANT REDUCTION; DYE AGGREGATION; EXCITED STATE LIFETIMES; LIGHT TO ELECTRICAL ENERGY CONVERSION; POST TREATMENT; SIGNIFICANT MECHANISM; ULTRA-FAST SPECTROSCOPIES;

ATOMIC LAYER DEPOSITION;

EID: 84924561728     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am507405b     Document Type: Article

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