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Volumn 115, Issue 33, 2011, Pages 16720-16729

ALD grown aluminum oxide submonolayers in dye-sensitized solar cells: The effect on interfacial electron transfer and performance

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION SITE; ALUMINUM OXIDES; ANATASE FILMS; ANATASE SURFACES; ATOMIC LAYER DEPOSITED; ATOMIC SCALE ROUGHNESS; AVERAGE DISTANCE; BARRIER LAYERS; CHARGE TRANSFER RESISTANCE; CONDUCTION BAND ELECTRONS; DENSITY FUNCTIONAL THEORY CALCULATIONS; DEPOSITED LAYER; DEPOSITION CYCLES; DYE-SENSITIZED SOLAR CELL; ELASTIC RECOIL DETECTION; ELECTROLYTE INTERFACES; EXPONENTIAL INCREASE; INJECTION EFFICIENCY; INTERFACIAL ELECTRON TRANSFER; NANOCRYSTALLINES; PRECURSOR MOLECULES; RECOMBINATION REACTIONS; RUTHENIUM BIPYRIDYL; SENSITIZED FILMS; SUB-MONOLAYERS; TIME OF FLIGHT; TIO; TRIIODIDE; TUNNEL BARRIER;

EID: 80051933634     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp204886n     Document Type: Article
Times cited : (56)

References (55)
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    • 80051936733 scopus 로고    scopus 로고
    • In Chapter 4: Jones, A. C. Hitchman, M. L. Chemical Vapour Deposition: Precursors, Processes and Applications; The Royal Society of Chemistry: Cambridge, U.K. Vol
    • Ritala, M.; Niinistö, J. In Chapter 4: Atomic Layer Deposition; Jones, A. C.; Hitchman, M. L., Eds.; Chemical Vapour Deposition: Precursors, Processes and Applications; The Royal Society of Chemistry: Cambridge, U.K., 2009; Vol. 1, pp 128-206.
    • (2009) Atomic Layer Deposition , vol.1 , pp. 128-206
    • Ritala, M.1    Niinistö, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.