Effects of an additional magnetic field in ITO thin film deposition by magnetron sputtering

Ceramics International

Volumn 41, Issue 1, 2015, Pages 617-621

  Heo, Kyong Chan ^a   Sohn, Youngku ^a   Gwag, Jin Seog ^a  

^a Yeungnam University   (South Korea)

Author keywords

Electrical resistivity; ITO film; Magnetic field; Magnetron sputtering; Solenoid coil

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; FILM GROWTH; GRAIN BOUNDARIES; HALL MOBILITY; HOLE MOBILITY; INDIUM COMPOUNDS; ITO GLASS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SOLENOIDS; SUBSTRATES; TEMPERATURE; TIN OXIDES;

DEPOSITION PROCESS; GLASS SUBSTRATES; INDIUM TIN OXIDE THIN FILMS; ITO FILMS; ITO THIN FILMS; LOW TEMPERATURES; PREFERENTIAL GROWTH; SOLENOID COILS;

THIN FILMS;

EID: 84922796642     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2014.08.111     Document Type: Article

References (16)

1. G. Li, C. W. Chu, V. Shrotriya, J. Huang, Y. Yang, Efficient inverted polymer solar cells, Appl. Phys. Lett. 88 (2006) 253503 (1)-253503 (3).
2. E. Bertan, C. Corbella, M. Vives, A. Pinyol, C. Person, I. Porqueras, RF sputtering deposition of Ag/ITO coatings at room temperature, Solid State Ionics 165 (2003) 139-148.
3. R. Latz, K. Michalel, M. Scherer, High conducting large area indium tin oxide electrodes for displays prepared by DC magnetron sputtering, Jpn. J. Appl. Phys. 30 (Part 2) (1991) L149-L151.
4. S. H. Choi, J. T. Kim, C. S. Kim, H. K. Baik, Highly efficient transparent organic light-emitting diodes by ion beam assisted deposition-prepared indium tin oxide cathode, Appl. Phys. Lett. 90 (2007) 033513 (1)-033513 (3).
5. 3 films: basic optical properties and applications to energy efficient windows, J. Appl. Phys. 60 (11) (1986) R123-R159.
6. Y. Shigesato, S. Takaki, T. J. Haranoh, Electrical and structural properties of low resistivity tindoped indium oxide films, J. Appl. Phys. 71 (1992) 3356-3364.
7. I. A. Rauf, Low resistivity and high mobility tin-doped indium oxide films, Mater. Lett. 18 (1993) 123-127.
8. C. Coutal, A. Azema, J. C. Roustan, Fabrication and characterization of ITO thin films deposited by excimer laser evaporation, Thin Solid Films 288 (1996) 248-253.
9. D. M. Mattox, Particle bombardment effects on thin-film deposition: a review, J. Vac. Sci. Technol. A 7 (1989) 1105-1114.
10. S. M. Rossnagel, J. J. Cumo, Film modification by low energy ion bombardment during deposition, Thin Solid Films 143 (1989) 143-156.
11. I. Ivanov, P. Kazansky, L. Hultman, I. Petrov, J. E. Sunndgren, Influence of an external axial magnetic field on the plasma characteristics and deposition conditions during direct current planar magnetron sputtering, J. Vac. Sci. Technol. A 12 (1994) 314-320.
12. C. Engstrom, T. Berlind, J. Birch, L. Hultman, I. Invanov, S. R. Kirkpatrick, S. Rohde, Design, plasma studies, and ion assisted thin film growth in an unbalanced dual target magnetron sputtering system with a solenoid coil, Vacuum 56 (2000) 107-113.
13. Y. S. Yang, W. Huang, Magnetic field effects on coating deposition rate and surface morphology coatings using magnetron sputtering, Smart Mater. Struct. 19 (2010) 124003 (1)-124003 (9).
14. K. L. Chopra, S. Major, D. K. Pandya, Transparent conductors - a status review, Thin Solid Films 102 (1983) 1-46.
15. M. Brikholz, Thin Film Analysis by X-ray Scattering, Wiley, Weinheim, 2006.
16. H. R. Fallah, M. Ghasemi, A. Hassanzadeh, H. Steki, The effect of annealing on structural, electrical and optical properties of nanostructured ITO films prepared by e-beam evaporation, Mater. Res. Bull. 42 (2007) 487-496.