Cu(110) surface in hydrochloric acid solution: Potential dependent chloride adsorption and surface restructuring

Journal of Physical Chemistry C

Volumn 119, Issue 4, 2015, Pages 1782-1790

  Goletti, C ^a   Bussetti, G ^a,c   Violante, A ^a,d   Bonanni, B ^a   Di Giovannantonio, M ^a   Serrano, G ^a   Breuer, S ^a,b   Gentz, K ^b   Wandelt, K ^b  

^a UNIVERSITY OF ROME TOR VERGATA   (Italy)

^b UNIVERSITY OF BONN   (Germany)

^c POLITECNICO DI MILANO   (Italy)

^d PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANISOTROPY; CHLORINE COMPOUNDS; COPPER; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL ELECTRODES; ELECTRODES; ELECTRONS; HYDROCHLORIC ACID; LOW ENERGY ELECTRON DIFFRACTION;

ELECTROCHEMICAL SCANNING TUNNELING MICROSCOPY; HYDROCHLORIC ACID SOLUTION; LINEARLY POLARIZED LIGHT; METAL ELECTROLYTE INTERFACES; REFLECTANCE ANISOTROPY SPECTROSCOPY; RESTRUCTURING PROCESS; STRUCTURAL TRANSITIONS; SURFACE RESTRUCTURING;

SCANNING TUNNELING MICROSCOPY;

EID: 84921955683     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp5073445     Document Type: Article

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