In-situ STM study of the initial stages of corrosion of Cu(100) electrodes in sulfuric and hydrochloric acid solution

Surface Science

Volumn 399, Issue 1, 1998, Pages 49-69

  Vogt, M R ^a   Lachenwitzer, A ^a   Magnussen, O M ^a   Behm, R J ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

Chemisorption; Chloride; Copper; Corrosion; Etching; Faceting; Scanning tunneling microscopy; Solid liquid interface; Surface structure

Indexed keywords

CHEMISORPTION; COPPER; DISSOLUTION; ETCHING; HYDROCHLORIC ACID; INTERFACES (MATERIALS); MOLECULAR STRUCTURE; SCANNING TUNNELING MICROSCOPY; SULFURIC ACID; SURFACE STRUCTURE;

ANODIC COPPER DISSOLUTION; MONOATOMIC ETCH PITS; STEP FLOW ETCHING;

CORROSION;

EID: 0032021509     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00811-X     Document Type: Article

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