Suppressing twin domains in molecular beam epitaxy grown Bi2Te3 topological insulator thin films

Crystal Growth and Design

Volumn 15, Issue 1, 2015, Pages 390-394

  Kampmeier, Jörn ^a   Borisova, Svetlana ^a   Plucinski, Lukasz ^a   Luysberg, Martina ^a   Mussler, Gregor ^a   Grützmacher, Detlev ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC INSULATORS; ELECTRONIC PROPERTIES; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; SILICON; SUBSTRATES; VAN DER WAALS FORCES; X RAY DIFFRACTION;

DEVICE APPLICATION; SI(111) SUBSTRATE; STATE OF THE ART; STRUCTURAL DEFECT; STRUCTURAL PERFECTION; TOPOLOGICAL INSULATORS; VAN DER WAALS POTENTIALS; X RAY DIFFRACTION POLE FIGURE;

THIN FILMS;

EID: 84920836548     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg501471z     Document Type: Article

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