Thickness dependent barrier performance of permeation barriers made from atomic layer deposited alumina for organic devices

Organic Electronics

Volumn 17, Issue , 2015, Pages 138-143

  Klumbies, Hannes ^a   Schmidt, Peter ^a   Hähnel, Markus ^a   Singh, Aarti ^b   Schroeder, Uwe ^b   Richter, Claudia ^b   Mikolajick, Thomas ^a,b   Hoßbach, Christoph ^a   Albert, Matthias ^a   Bartha, Johann W ^a   Leo, Karl ^a   Müller Meskamp, Lars ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Nanoelectronic Materials Laboratory GmbH   (Germany)

Author keywords

ALD; Defect density; Electrodeposition; OLED; Thickness dependency; WVTR

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; CALCIUM; DEGRADATION; ELECTRODEPOSITION; ELECTRODES; ORGANIC LIGHT EMITTING DIODES (OLED); ORGANIC SOLAR CELLS; SOLAR CELLS; THIN FILMS;

ATOMIC LAYER DEPOSITED; CRITICAL FILM THICKNESS; LOW DEFECT DENSITIES; OLED; ORGANIC LIGHT EMITTING DIODES(OLEDS); THICKNESS DEPENDENCY; WATER VAPOR TRANSMISSION RATE; WVTR;

DEFECT DENSITY;

EID: 84919598730     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2014.12.003     Document Type: Article

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