Effect of leaving group on the structures of alkylsilane SAMs

Langmuir

Volumn 30, Issue 49, 2014, Pages 14824-14831

  Naik, Vikrant V ^a   Städler, Roman ^a   Spencer, Nicholas D ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; INFRARED SPECTROSCOPY; SILANES;

CHEMICAL NATURE; HIGH SENSITIVITY; LEAVING GROUPS; METHOXYSILANE; MOLECULAR CONFORMATION; MULTIPLE TRANSMISSION; RATE OF HYDROLYSIS; SILANOL GROUPS;

SELF ASSEMBLED MONOLAYERS;

EID: 84918830670     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la503739j     Document Type: Article

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