Hydrogen sensing performance of a nickel oxide (NiO) thin film-based device

International Journal of Hydrogen Energy

Volumn 40, Issue 1, 2015, Pages 729-734

  Chou, Po Cheng ^a   Chen, Huey Ing ^a   Liu, I Ping ^a   Chen, Chun Chia ^a   Liou, Jian Kai ^a   Hsu, Kai Siang ^a   Liu, Wen Chau ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

H2 sensor; NiO thin film; Resistance; Response (recovery) time constant; RF sputtering; Sensing response ratio

Indexed keywords

CHEMICAL SENSORS; CHEMICAL STABILITY; ELECTRIC RESISTANCE; HYDROGEN; MEMS; NICKEL; THIN FILMS;

HYDROGEN CONCENTRATION; NICKEL OXIDES (NIO); NIO THIN FILM; OPERATING TEMPERATURE; RADIO-FREQUENCY SPUTTERING; RF-SPUTTERING; SENSING RESPONSE; TIME CONSTANTS;

NICKEL OXIDE;

EID: 84916238156     PISSN: 03603199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijhydene.2014.10.142     Document Type: Article

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