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Thin Solid Films

Volumn 520, Issue 10, 2012, Pages 3839-3842

Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor

(6) Green, S V a,b Watanabe, M b Oka, N b Niklasson, G A a Granqvist, C G a Shigesato, Y b

a UPPSALA UNIVERSITY (Sweden)

b AOYAMA GAKUIN UNIVERSITY (Japan)

Author keywords

Charge capacity; Electrochromism; Nickel oxide; Optical properties; RF magnetron sputtering; Thin film; Water vapor

Indexed keywords

AMORPHOUS STRUCTURES; CHARGE CAPACITIES; COLORATION EFFICIENCIES; ELECTROCHROMIC PROPERTIES; ELECTROCHROMICS; METALLIC NICKEL; PRESENCE OF WATER; RF-MAGNETRON SPUTTERING; WATER PARTIAL PRESSURE;

AMORPHOUS FILMS; ELECTROCHROMISM; MAGNETRON SPUTTERING; NICKEL OXIDE; OPTICAL PROPERTIES; VAPORS; WATER VAPOR;

THIN FILMS;

EID: 84858334155 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.030 Document Type: Conference Paper

Times cited : (35)

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